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À̸ÞÀÏ)office@icmap2020.org   ÀüÈ­) 042-472-7460


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The 8th ICMAP & The 9th ISFM

2021³â 1¿ù 17ÀÏ- 20ÀÏ ¤Ó ¿Â¶óÀÎ ÄÁÆÛ·±½º

 

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Çѱ¹Áø°øÇÐȸ ÁÖ°üÀ¸·Î, The 8th International Conference on Microelectronics and Plasma Technology(The 8th ICMAP) & The 9th International Symposium on Functional Materials(The 9th ISFM)°¡ ´Ù°¡¿À´Â 2021³â 1¿ù 17~20ÀÏ¿¡ ¿Â¶óÀÎ ÄÁÆÛ·±½º·Î °³Ãֵ˴ϴÙ. (¿ÀÇÁ¶óÀÎ ÄÁÆÛ·±½º´Â ¼Ò±Ô¸ðÀÇ Àοø¿¡ ÇÑÇÏ¿© °æ±âµµ È­¼º½Ã ·Ñ¸µÈú½º¿¡¼­ ÁøÇàµÉ ¿¹Á¤ÀÔ´Ï´Ù.)

 

The 8th ICMAP & The 9th ISFM ¿¡´Â Àú¸íÇÑ 5¸íÀÇ ±âÁ¶°­¿¬°ú  45¸íÀÇ ÃÊû¿¬»ç °­¿¬À» Æ÷ÇÔÇÑ ±¸µÎ¼¼¼Ç, Æ÷½ºÅÍ ¼¼¼ÇÀÌ ÁøÇàµÉ ¿¹Á¤À̸ç,

¡º½ºÆä¼È ¼¼¼Ç¡»°ú ¡ºÆ©Å丮¾ó ¼¼¼Ç¡»µµ ¾Æ·¡¿Í °°ÀÌ ¸¶·ÃÇϰí ÀÖÀ¸´Ï ¸¹Àº °ü½É°ú Âü¿© ºÎŹ µå¸³´Ï´Ù!

 

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µ¥ÀÌÅͱâ¹ÝÀÇ ÇöóÁ °øÁ¤Àåºñ Áö´ÉÈ­ ±â¼ú °³¹ß

KRISS (ÀÌȿâ ¹Ú»ç)

ÇöóÁ Á¤¹Ð ÃøÁ¤ ±â¼ú ¹× TTTM Solution

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Toward Predictable 3D Topography Simulation of the Emerging Plasma Processes

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°øÁ¤º° Wafer Edge Risk, ±×¸®°í ¼Ò-ºÎ-Àå ¹ßÀü ¹æÇâ Á¦¾ð

TEL (¹Ú¿µ¿ì CTO)

Plasma Enhanced Technologies for the Future Generations

¿øÀÍ IPS (½ÅÇüÁÖ »ó¹«)

Challenges and Opportunities for Plasma Deposition Equipments Technology

 

¢Â Æ©Å丮¾ó ¼¼¼Ç (Çѱ¹¾î ¼¼¼Ç)

 

¡Ü Æ©Å丮¾ó ¼¼¼Ç 1 : ½Ã¹Ä·¹À̼Ǡ

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Áø°ø ȯ°æÀÇ ÀÌÇØ¿Í ICP Dry Etcher ÇØ¼®

ÁÖÁ¤ÈÆ ±³¼ö (±º»ê´ëÇб³)

ÇöóÁ ½Ã¹Ä·¹À̼ÇÀÇ ±âº»¿ø¸® ¹× FEMÀ» ÀÌ¿ëÇÑ Àû¿ë, È®Àå °¡´É¼º

ÃÖÈñȯ ±³¼ö (Çѱ¹Ç×°ø´ëÇб³)

¹ÝµµÃ¼ °øÁ¤¿ë ÇöóÁ ÀåºñÀÇ ½Ã¹Ä·¹ÀÌ¼Ç ¹æ¹ý°ú ¾ÕÀ¸·ÎÀÇ ¹æÇâ

±èÈ£ÁØ ±³¼ö (°¡Ãµ´ëÇб³)

 

¡Ü Æ©Å丮¾ó ¼¼¼Ç 2 : Áø´Ü

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¡Ü Æ©Å丮¾ó ¼¼¼Ç 3 : ºÐ¼®

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XPS

Àüöȣ ¹Ú»ç (KBSI)

SIMS

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TEM/SEM

ÀåÀçÇõ ¹Ú»ç (KBSI)

XRD

±èÈñÁø ¹Ú»ç (KBSI)

 

¡Ü Æ©Å丮¾ó ¼¼¼Ç 4 : Atomic Layer Deposition (ALD)

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ALD Fundamentals

ÀÌÇѺ¸¶÷ ±³¼ö (ÀÎõ´ëÇб³)

ALD ¼ÒÀç ºÎǰ Àåºñ

ÀÌ¿øÁØ ±³¼ö (¼¼Á¾´ëÇб³)

ALD Applications

ÀüÇüŹ ±³¼ö (ÇѾç´ëÇб³)

 

¡Ü Æ©Å丮¾ó ¼¼¼Ç 5 : Atomic Layer Etching (ALE)

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Plasma Etch Fundamentals

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Anisotropic ALE

¿°±Ù¿µ ±³¼ö (¼º±Õ°ü´ëÇб³)

Isotropic ALE

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¢Â Tutorial Sessions (¿µ¾î ¼¼¼Ç)

- Çà»ç±â°£µ¿¾È ¿Â¶óÀÎ ÄÁÆÛ·±½º ÆäÀÌÁö¿¡¼­ ¾ðÁ¦µçÁö ½Ãû °¡´ÉÇÕ´Ï´Ù.

 

¡Ü Tutorial Session 1 : Bio Science Medicine

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Plasma Biology

Prof. David Graves (Univ. of California, USA)

Influence of Cold Atmospheric Pressure Plasma on Wound Healing

Dr. Kai Masur (INP, Germany)

Nonthermal Biocompatible Plasma (NBP) Sources and Their RONS Characteristics for Plasma Biosciences

Prof. Eun Ha Choi (Kwangwoon Univ., Korea)

 

¡Ü Tutorial Session 2 : Introduction to Plasma Process for Semiconductor Fabrication

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Introduction to Plasma Process for Semiconductor Fabrication

Prof. ShinJae You (Chungnam Nat¡¯l Univ., Korea)

 

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2021³â 1¿ù 10ÀÏ(ÀÏ)±îÁö ÇÒÀÎµÈ °¡°ÝÀ¸·Î µî·ÏÇÏ½Ç ¼ö ÀÖÀ¸´Ï, ÇÒÀÎ ÇýÅÃÀ» ³õÄ¡Áö ¸¶¼¼¿ä!

-µî·Ï ¾È³» ÆäÀÌÁö: http://www.icmap2020.org/registration.php

 

ÀÌ ¿Ü¿¡ ÀÚ¼¼ÇÑ »çÇ×Àº ÇÐȸ °ø½Ä ȨÆäÀÌÁö(www.icmap2020.org)¸¦ ÅëÇØ È®ÀÎÇÏ½Ç ¼ö ÀÖ½À´Ï´Ù.

 

»õÇØ º¹ ¸¹ÀÌ ¹ÞÀ¸½Ã°í, Çмú´ëȸ¿¡¼­ ¸¸³ª ºË±æ ¹Ù¶ø´Ï´Ù.

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The 8th ICMAP & The 9th ISFM Secretariat

----------------------------------------------------------------------------------------------------

Tel. +82-42-472-7460 / Fax. +82-42-472-7459 /

E-mail. office@icmap2020.org / Web. http://www.icmap2020.org/






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