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No. Á¦¸ñ ÀÛ¼ºÀÚ ÀÛ¼ºÀÏ Á¶È¸
40 ÀüÀڽŹ® ÁÖÃÖ-Å×Å©À§Å© ¾È³»(ÀÛ¼ºÀÏ:2018-06-12) °ü¸®ÀÚ 20.05.14 5,673
39 Á¦8ȸ ¹ÝµðÁ¦ÁÖÆ÷·³ Æ©Å͸®¾ó(5/11(±Ý), Á¦ÁÖ´ë) ¾È³»(ÀÛ¼ºÀÏ:2018-04-25) °ü¸®ÀÚ 20.05.14 6,169
38 Á¦8ȸ ¹ÝµðÁ¦ÁÖÆ÷·³(5/11~12) °³ÃÖ ¾È³»(ÀÛ¼ºÀÏ:2018-04-25) °ü¸®ÀÚ 20.05.14 8,332
37 ¹ÝµµÃ¼ ÀüÀÚÀç·á ÄÁÆÛ·±½º(SMC Korea 2018) °³ÃÖ ¾È³»(ÀÛ¼ºÀÏ:2018-04-25) °ü¸®ÀÚ 20.05.14 13,657
36 International Conference on Microelectronics and Plasma Technology (ICMAP 2018) Çà»ç °³ÃÖ(7¿ù 25ÀÏ~28ÀÏ) ¹× ÃÊ·Ï Á¢¼ö ¾È³»(ÀÛ¼ºÀÏ:2018-04-09) °ü¸®ÀÚ 20.05.14 16,707
35 Á¦8ȸ ¹ÝµµÃ¼.µð½ºÇ÷¹ÀÌ Á¦ÁÖ Æ÷·³ °³ÃÖ ¾È³»(ÀÛ¼ºÀÏ:2018-04-02) °ü¸®ÀÚ 20.05.14 10,769
34 Çѱ¹ ALD workshop -14 ¾È³»(2Â÷)(ÀÛ¼ºÀÏ:2018-04-02) °ü¸®ÀÚ 20.05.14 12,428
33 2018³â Ãá°èÇмú´ëȸ ¾È³»(¹Ýµð±â¼úÇÐȸ)(ÀÛ¼ºÀÏ:2018-03-09) °ü¸®ÀÚ 20.05.14 5,584
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31 ¡°±Û·Î¹ú ¹ÝµµÃ¼ ¼ÒÀ硤ºÎǰ ¹× Àåºñ»ê¾÷ À°¼º¡±À» À§ÇÑ »ê¾÷°è(»ê¡¤ÇС¤¿¬) ÀÇ°ß ¼ö·Å ¼³¸íȸ(2¿ù22ÀÏ (¸ñ)) ¼³¹®Á¶»ç ¾ç½Ä ÷ºÎ(ÀÛ¼ºÀÏ:2018-02-20) °ü¸®ÀÚ 20.05.14 5,510