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2025³â Á¦5ȸ ÇöóÁ RF ±â¼ú¿¬±¸È¸ ¿öÅ©¼ó

*ÀϽà : 2025³â 5¿ù 8ÀÏ(¸ñ) 13:00 ~ 18:00 (µî·Ï: 12:30ºÐ~)
*Àå¼Ò : °úÇбâ¼úÄÁº¥¼Ç¼¾ÅÍ ´ëȸÀǽÇ1(B1F)(¼­¿ï °­³²±¸)

*ÁÖÃÖ : Çѱ¹¹ÝµµÃ¼µð½ºÇ÷¹À̱â¼úÇÐȸ(ÇöóÁ RF ±â¼ú¿¬±¸È¸)

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12:30~Çà»ç µî·Ï-
13:00~13:10¿¬±¸È¸ ȸÀå Àλ縻 Á¤Áø¿í ±³¼ö
(¿¬±¸È¸ ȸÀå)
13:10~13:40¹ÝµµÃ¼ °øÁ¤¿¡¼­ÀÇ Àåºñ ±â¼ú°ú ¹Ì·¡

±èÅÂȯ ºÎ»çÀå

(SKÇÏÀ̴нº)



13:40~14:10ÃֽŠPlasma etchÀåºñÀÇ ¾ç»ê¼ºÀ» À§ÇÑ ¿ä°Ç

¹ÚÁ¾Ã¶ ¸¶½ºÅÍ

(»ï¼ºÀüÀÚ)

14:10~14:50

On the Smart R Wave source for HARC Etching

ÀåÈ«¿µ ±³¼ö

(KAIST)

14:50~15:00Break

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15:00~15:30Advanced packagingÀ» À§ÇÑ ÇöóÁ °øÁ¤ ÀåºñÀÇ ÀÀ¿ëÀåÁÖÈñ ¸Å´ÏÀú(KLA)
15:30~16:00Precision RF Power Control in CVD/Etch Semiconductor Equipment

À̱âÈÆ ºÎ»çÀå

(AE ÄÚ¸®¾Æ)




16:00~16:40To be announced

¿°±Ù¿µ ±³¼ö

(¼º±Õ°ü´ë)

16:40~16:50Break
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16:50~17:20

3D NAND Plug Etch Process ÀÇ ÇöÀç¿Í ¹Ì·¡

ÀÌÀç¿ø ¹Ú»ç

(SKÇÏÀ̴нº)

17:20~18:00ÇÿøÀÚ ¼öÁØ ½Ä°¢ ÁõÂø °øÁ¤À» À§ÇÑ ÇöóÁ ¼Ò½º ±â¼ú

Á¤Áø¿í ±³¼ö

(ÇѾç´ë)


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